CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME
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United States of America Patent
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N/A
Issued Date -
N/A
app pub date -
Mar 31, 2016
filing date -
Apr 20, 2015
priority date (Note) -
Abandoned
status (Latency Note)
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Importance

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Non-US Coverage
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Abstract
A chemical for photolithography to uniformly form a thick film to a desired thickness while enhancing a liquid transfer property by lowering the viscosity of a composition for photolithography, and a resist composition including the same. The chemical includes a solvent having a saturated vapor pressure and viscosity within predetermined ranges, and a resin is formed as a film having a thickness of 5 μm or more through spin coating.
First Claim
all claims..Other Claims data not available
Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
KR | B1 | KR102630879 | Apr 15, 2016 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
PATENT SPECIFICATION | 송액성이 개선된 포토리소그래피용 약액 및 이를 포함하는 레지스트 조성물 | Jan 30, 2024 | |||
JP | B2 | JP6863682 | Apr 19, 2016 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
PUBLISHED GRANTED PATENT (SECOND LEVEL) | 送液性が改善されたフォトリソグラフィー用薬液及びこれを含むレジスト組成物{CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME} | Apr 21, 2021 | |||
CN | B | CN106066576 | Apr 20, 2016 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT FOR INVENTION | Chemical liquid for lithography with improved liquid-feed properties and resist composition containing same | Mar 15, 2022 | |||
US | A1 | US20170343897 | Aug 04, 2017 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
FIRST PUBLISHED PATENT APPLICATION | CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME | Nov 30, 2017 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
TOKYO OHKA KOGYO CO LTD | 150 NAKAMARUKO NAKAHARA-KU KANAGAWA-KEN KAWASAKI-SHI |
International Classification(s)

- 2016 Application Filing Year
- G03F Class
- 1979 Applications Filed
- 1508 Patents Issued To-Date
- 76.21 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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SOMEYA, Yasuo | Incheon, KR | 7 | 3 |
# of filed Patents : 7 Total Citations : 3 | |||
YONEMURA, Koji | Incheon, KR | 29 | 169 |
# of filed Patents : 29 Total Citations : 169 | |||
YOON, Deuk Young | Incheon, KR | 2 | 3 |
# of filed Patents : 2 Total Citations : 3 |
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Patent Citation Ranking
- 2 Citation Count
- G03F Class
- 19.15 % this patent is cited more than
- 9 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Apr 20, 2028 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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