CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME

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United States of America Patent

SERIAL NO

15087637

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Abstract

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A chemical for photolithography to uniformly form a thick film to a desired thickness while enhancing a liquid transfer property by lowering the viscosity of a composition for photolithography, and a resist composition including the same. The chemical includes a solvent having a saturated vapor pressure and viscosity within predetermined ranges, and a resin is formed as a film having a thickness of 5 μm or more through spin coating.

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Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTDKANAGAWA KANAGAWA

International Classification(s)

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  • 2016 Application Filing Year
  • G03F Class
  • 1979 Applications Filed
  • 1508 Patents Issued To-Date
  • 76.21 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20162017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SOMEYA, Yasuo Incheon, KR 7 3
YONEMURA, Koji Incheon, KR 29 169
YOON, Deuk Young Incheon, KR 2 3

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Patent Citation Ranking

  • 2 Citation Count
  • G03F Class
  • 19.15 % this patent is cited more than
  • 9 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2247791173165322101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6071 - 8081 - 90100 +050100150200250300350400450500550600650700750800850

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