METHODS AND CHEMICAL SOLUTIONS FOR CLEANING PHOTOMASKS USING QUATERNARY AMMONIUM HYDROXIDES

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Oct 20, 2016
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Apr 19, 2016
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Apr 20, 2015

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Abstract

Embodiments provided herein describe methods and chemical solutions for cleaning photomasks. A photomask is provided. The photomask is exposed to a chemical solution. The chemical solution includes a quaternary ammonium hydroxide.

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Patent Owner	Address
SAMSUNG ELECTRONICS CO LTD	129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677
INTERMOLECULAR INC	3011 NORTH FIRST STREET SAN JOSE CA 95134

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Inventor Name	Address	# of filed Patents	Total Citations
Choi, Jae-Hyuck	Gyeonggi-Do, KR	18	72
Lowe, Jeffrey	Cupertino, US	3	0
Van, Berkel Kim	San Jose, US	16	504

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METHODS AND CHEMICAL SOLUTIONS FOR CLEANING PHOTOMASKS USING QUATERNARY AMMONIUM HYDROXIDES

Number of patents in Portfolio can not be more than 2000

United States of America Patent

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15132480

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