SOLAR CELL AND FABRICATION METHOD THEREOF
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United States of America Patent
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Issued Date -
Oct 13, 2016
app pub date -
Jan 4, 2016
filing date -
Apr 9, 2015
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Abstract
A solar cell with high-reflectivity region and narrow etch mark is disclosed. The solar cell includes a semiconductor substrate having a first surface and a second surface, a low-reflectivity region in and on the semiconductor substrate, and an annular etch mark disposed on the first surface and surrounding the low-reflectivity region. The etch mark is located along the perimeter of the first surface and has an average width that is not greater than 2 mm. The second surface is a surface with high reflectivity.
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