MASK, MANUFACTURING METHOD THEREOF AND EXPOSURE APPARATUS
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United States of America Patent
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Issued Date -
Oct 13, 2016
app pub date -
Mar 24, 2016
filing date -
Apr 13, 2015
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Abstract
The present invention provides a mask, comprising a base substrate, a first mask pattern formed on an upper surface of the base substrate, and a second mask pattern formed on a lower surface of the base substrate. Each of the first and second mask patterns comprises a light transmissive region and a light blocking region. A projection of the light transmissive region of the first mask pattern on a plane where the second mask pattern is located is outside the light blocking region of the second mask pattern, and the light blocking region of the second mask pattern can block at least part of light diffracted at a boundary between the light blocking region and the light transmissive region of the first mask pattern, to prevent the at least part of light from emitting from the light transmissive region of the second mask pattern.
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