APPLICATION OF ELECTRON-BEAM INDUCED PLASMA PROBES TO INSPECTION, TEST, DEBUG AND SURFACE MODIFICATIONS

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United States of America Patent

APP PUB NO 20160299103A1
SERIAL NO

15026953

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Abstract

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An electron-beam induced plasmas is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

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Patent Owner(s)

Patent OwnerAddress
ORBOTECH LTDISRAEL JAVNE
PHOTON DYNAMICS INC17 GREAT OAKS BOULEVARD SAN JOSE CA 95119

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Glazer, Arie Mevaseret, IL 15 46
Krishnaswami, Sriram Saratoga, US 20 240
Loewinger, Ronen San Francisco, US 3 15
Saleh, Nedal Santa Clara, US 12 28
Sterling, Enrique San Jose, US 1 8
Toet, Daniel Monte Sereno, US 12 80

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