PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM
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United States of America Patent
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Issued Date -
Oct 6, 2016
app pub date -
Mar 23, 2016
filing date -
Mar 23, 2016
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Abstract
A photosensitive polysiloxane composition having good adhesion during development, a protective film, and an element having the protective film are provided. The photosensitive polysiloxane composition includes a polysiloxane (A), an o-naphthoquinonediazidesulfonate (B), and a solvent (C). The polysiloxane (A) is obtained via the polycondensation of a monomer component, wherein the monomer component includes a titanium-containing compound (a-1) and a silane monomer (a-2) represented by formula (2). The titanium-containing compound (a-1) is selected from the group consisting of a compound represented by formula (1-1) and a hydrolyzable titanium dimer.
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