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Abstract

A sequential inductively coupled plasma (ICP) optical emission spectrometer includes a controller that operates to perform a series of process based on a shift amount (time dependency) of a wavelength peak position according to time elapse of a reference wavelength obtained as a result of continuously measuring a plurality of emission lines of argon having different wavelengths as the reference wavelength and a per-wavelength shift amount (wavelength dependency) of the reference wavelength, the process including: calculating a shift amount of a wavelength peak position of each measurement wavelength from a standard sample measurement time to an unknown sample measurement time; and performing measurement wavelength correction for correcting the movement position of the diffracting grating corresponding to the wavelength peak position of the measurement wavelength relative to the initial position.

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