APPARATUS AND METHOD FOR FORMING THIN PROTECTIVE AND OPTICAL LAYERS ON SUBSTRATES
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Oct 6, 2016
app pub date -
Jun 1, 2016
filing date -
Jun 19, 2012
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A method and apparatus are provided for plasma-based processing of a substrate based on a plasma source having at least two adjacent electrodes positioned with the long dimensions parallel to define a first minimum gap between the two electrodes of from 5 millimeters to 40 millimeters. A second minimum gap is defined between the two electrodes and the substrate. AC power is provided to the two electrodes through separate electrical circuits from a common supply with a phase difference therebetween. A first gas and a second gas are injected into the plasma-containing volume between the two electrodes at different positions relative to the substrate. A lower electrode with a lower electrode width that is less than the combined width of the two electrodes is powered from a separately controllable AC power supply at an AC frequency different from that supplied to the two electrodes.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully