SPLIT-GATE FLASH MEMORY WITH IMPROVED PROGRAM EFFICIENCY

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United States of America Patent

APP PUB NO 20160268387A1
SERIAL NO

14643558

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A split gate memory cell is fabricated with a word gate extending below an upper surface of a substrate having the channel region. An embodiment includes providing a band engineered channel with the word gate extending there through. Another embodiment includes forming a buried channel with the word gate extending below the buried channel.

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Patent Owner(s)

Patent OwnerAddress
GLOBALFOUNDRIES SINGAPORE PTE LTD60 WOODLANDS INDUSTRIAL PARK D STREET 2 SINGAPORE 738406

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
TAN, Shyue Seng (Jason) Singapore, SG 9 96
TOH, Eng Huat Singapore, SG 256 1730

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