GLASS SUBSTRATE FOR MASK BLANK
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United States of America Patent
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Issued Date -
Sep 15, 2016
app pub date -
Feb 24, 2016
filing date -
Feb 24, 2016
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Abstract
A glass substrate for a mask blank includes two main surfaces facing each other, side surfaces and surfaces to be chamfered. The surfaces to be chamfered are provided peripherally around each of the two main surfaces. At least one of the side surfaces and the surfaces to be chamfered in the glass substrate has, in a measurement area with an atomic force microscope (AFM) of 3 μm square, an arithmetic mean roughness (Ra) of 0.5 nm or less and a dale void volume (Vvv) obtained from a bearing area curve as defined in ISO 25178-2(2012) of 1.5×107 nm3 or less.
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