EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY

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United States of America Patent

APP PUB NO 20160265103A1
SERIAL NO

15030580

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Methods described herein generally relate to producing patterned graphene. The method may include irradiating at least one focal point on a surface of a metal substrate with a laser beam in the presence of carbon dioxide, wherein the laser beam is generated by an ultra-short pulse laser; and causing the laser beam to move relative to the surface of the metal substrate such that the at least one focal point is displaced along a pattern on the surface, thereby producing a patterned graphene. Apparatuses for producing patterned graphene are also disclosed.

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Patent Owner(s)

Patent OwnerAddress
EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY200237 NO 130 MEILONG ROAD SHANGHAI XUHUI DISTRICT SHANGHAI CITY SHANGHAI CITY 200237

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
DONG, Jianbo Shanghai, CN 18 35
DONG, Xiangmao Shanghai, CN 9 3
QIAN, Xiuzhen Shanghai, CN 9 12
ZHAO, Chongjun Shanghai, CN 10 13

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