METHOD OF CLEANING MASK COVER AND CLEANING BOARD
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United States of America Patent
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Issued Date -
Sep 15, 2016
app pub date -
Feb 23, 2016
filing date -
Mar 10, 2015
priority date (Note) -
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Abstract
In one embodiment, a method of cleaning a mask cover includes loading a cleaning board including a foreign substance removal portion in a surface of the cleaning board into a mask cover housing chamber of a charged particle beam lithography system, the mask cover housing chamber housing a mask cover including: a frame having a central opening; a grounding plate positioned on the frame such that an end of the grounding plate protrudes toward an inner side of the opening, and a grounding pin protruding downward from the end of the grounding plate, positioning the cleaning board below the mask cover, and bringing the mask cover and the cleaning board close to or contact with each other such that the foreign substance removal portion removes a foreign substance attached to the grounding pin.
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