ADHESION IMPROVEMENTS FOR OXIDE-SILICON STACK
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United States of America Patent
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Issued Date -
Sep 8, 2016
app pub date -
Oct 15, 2014
filing date -
Nov 4, 2013
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Abstract
Embodiments generally relate to methods of controlling hydrogen content in a silicon oxide/amorphous silicon stack. By precleaning the substrate of residues, controlling the delivery of hydrogen during the stack deposition and preventing outgassing of hydrogen from deposited layers during subsequent layer deposition and processing, the effects of delamination can be avoided in the formation of devices, such as 3D NAND devices.
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