METHOD FOR MANUFACTURING THIN FILM
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United States of America Patent
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Issued Date -
Aug 25, 2016
app pub date -
Jun 18, 2013
filing date -
Jun 18, 2013
priority date (Note) -
Abandoned
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Abstract
The present invention includes the steps of: preparing a substrate; preparing a raw material including organic silane having CxHy (here, 1≦x≦9, 4≦y≦20, Y>2X) as a functional group; vaporizing the raw material; loading the substrate to the inside of a chamber; and supplying the vaporized raw material into the chamber. Accordingly, the present invention can manufacture a thin film without degrading the film quality even at low temperatures, and can more reliably and stably manufacture a device for which a low-temperature process is required.
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