Photoconducting layered material arrangement, method of fabricating the photoconducting layered material arrangement, and use of photoconducting layered material arrangement
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United States of America Patent
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Issued Date -
Aug 18, 2016
app pub date -
Feb 12, 2016
filing date -
Feb 13, 2015
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A photoconducting layered material arrangement for producing or detecting high frequency radiation includes a semiconductor material including an alloy comprised of InGaAs, InGaAsSb, or GaSb, with an admixture of Al, which material is applied to a suitable support substrate in a manner such that the lattices are suitably adjusted, wherewith the semiconductor material comprised of InGaAlAs, InGaAlAsSb, or GaAlSb has a band gap of more than 1 eV, as a consequence of the admixed proportion of Al. The proportion x of Al in the semiconductor material InyGa1−y−xAlxAs is between x=0.2 and x=0.35, wherewith the proportion y of In may be between 0.5 and 0.55. The support substrate is InP or GaAs.
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