COATING COMPOSITION, AND PROCESS FOR PRODUCING PHOTORESIST LAMINATE
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United States of America Patent
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app pub date -
Apr 27, 2016
filing date -
Nov 29, 2013
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Abandoned
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Abstract
To provide a coating composition which exhibits excellent followability to a difference in level in its application, and which is capable of forming a coating layer having a low refractive index in a short-wavelength region and exhibiting excellent solubility to an alkaline aqueous solution. A coating composition comprising a solvent and a fluorinated polymer (A) which has a unit represented by —[CX1X2—CY(—Rf—COOM)]— and has a number average molecular weight of from 1,000 to 7,500. X1 and X2 are each independently a hydrogen atom, a fluorine atom or a chlorine atom; Y is a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group or a trifluoromethyl group; Rf is a branched perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or a branched oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms; and M is a hydrogen atom or an ammonium ion which may be substituted.
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