METHOD FOR ESTIMATING LIFETIME OF CATHODE IN ELECTRON BEAM LITHOGRAPHY APPARATUS
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United States of America Patent
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Issued Date -
Aug 18, 2016
app pub date -
Feb 10, 2016
filing date -
Feb 16, 2015
priority date (Note) -
Published
status (Latency Note)
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Abstract
A method for estimating a lifetime of a cathode in an electron beam lithography apparatus according to an embodiment, includes: calculating emittance of the cathode by using a lifetime reference value of the cathode; calculating an emitter lifetime diameter of the cathode by using the emittance; writing a pattern on a target object by using an electron beam emitted from the cathode; measuring emission current of the electron beam; calculating an emitter diameter by using the emission current; determining a regression formula of a change with time of the emitter diameter; and estimating the lifetime of the cathode by using the regression formula and the emitter lifetime diameter.
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