SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM
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United States of America Patent
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Issued Date -
Aug 18, 2016
app pub date -
Mar 30, 2015
filing date -
Mar 30, 2015
priority date (Note) -
Abandoned
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Abstract
Provided is a substrate processing apparatus includes: a process chamber; a substrate support table; a rotation unit; a plurality of source gas supply structures; a source gas supply unit; a plurality of source gas exhaust structures; a plurality of source gas exhaust pipes; a source gas exhaust unit; a plurality of reactive gas supply structures; a reactive gas supply unit; a plurality of reactive gas exhaust structures; a plurality of reactive gas exhaust pipes; a reactive gas exhaust unit; a plurality of reactive gas pressure detectors; and a controller configured to control at least the source gas supply unit, the source gas exhaust unit, the reactive gas supply unit, the reactive gas exhaust unit and the plurality of reactive gas pressure detectors.
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