CLEANING APPARATUS FOR SEMICONDUCTOR EQUIPMENT
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United States of America Patent
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Apr 20, 2016
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Feb 1, 2010
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Abstract
A cleaning apparatus for a semiconductor equipment is provided. The cleaning apparatus comprising a cleaning pad with a plurality of brushes thereon is located on a rotor of the semiconductor equipment to remove residues within the semiconductor equipment by using the brushes against the residues via moving and rotating the rotor and the cleaning apparatus.
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