POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
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United States of America Patent
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Issued Date -
Aug 11, 2016
app pub date -
Feb 4, 2016
filing date -
Feb 5, 2015
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Abandoned
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Abstract
A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer.
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