Method for Forming Hole Pattern and Method for Manufacturing TFT Display Using the Same
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United States of America Patent
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Issued Date -
Aug 4, 2016
app pub date -
Jan 28, 2016
filing date -
Jan 28, 2016
priority date (Note) -
Abandoned
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Abstract
Provided herein is a method for forming a hole pattern and a method for manufacturing a TFT display using the same, the hole pattern forming method including forming a light shield section above a substrate; applying a photoresist above the light shield section; downward light exposing of positioning a mask above the light shield section and then exposing the photoresist to light being emitted downwards from above the substrate; upward light exposing of exposing the photoresist to light being emitted upwards from below the substrate; and removing the photoresist not exposed to light at the downward light exposing and upward light exposing, thereby using the hole pattern forming method to manufacture a TFT display having improved opening rate and transmission rate.
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