COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOV OLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL

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United States of America Patent

SERIAL NO

15080374

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Abstract

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A composition for forming a passivation layer, including a resin and a compound represented by Formula (I): M(OR1)m. In Formula (I), M includes at least one metal element selected from the group consisting of Nb, Ta, V, Y and Hf, each R1 independently represents an alkyl group having from 1 to 8 carbon atoms or an aryl group having from 6 to 14 carbon atoms, and m represents an integer from 1 to 5.

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Patent Owner(s)

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HITACHI CHEMICAL COMPANY LTDCHIYODA-KU TOKYO 100-6606

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ADACHI, Shuichiro Ibaraki, JP 25 58
HAMAMURA, Hirotaka Tokyo, JP 32 208
HATTORI, Takashi Tokyo, JP 165 1633
HAYASAKA, Tsuyoshi Ibaraki, JP 6 10
KURATA, Yasushi Ibaraki, JP 64 744
MATSUMURA, Mieko Tokyo, JP 25 364
MORISHITA, Masatoshi Tokyo, JP 27 113
NOJIRI, Takeshi Ibaraki, JP 67 303
ORITA, Akihiro Ibaraki, JP 34 71
TANAKA, Tooru Ibaraki, JP 47 410
WATANABE, Keiji Tokyo, JP 148 2038
YOSHIDA, Masato Ibaraki, JP 214 2996

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