RELEASE FILM, METHOD FOR MANUFACTURING MOLDED ARTICLE, SEMICONDUCTOR COMPONENT, AND REFLECTOR COMPONENT

United States of America Patent

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Issued Date
Jul 14, 2016
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Aug 25, 2014
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Sep 10, 2013

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Abstract

In the release film of the present invention, each of thermal shrinkage ratios in an MD direction and a TD direction at 120° C. is not less than 5%.

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Patent Owner(s)

Patent Owner	Address
ASAHI KASEI CHEMICALS CORPORATION	1-105 KANDA JINBOCHO CHIYODA-KU TOKYO 101-8101

International Classification(s)

B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
KASAMATSU, Chika	Tokyo, JP	2	2
MARUYAMA, Mutsuhiro	Tokyo, JP	4	61
MATSUKI, Yutaka	Tokyo, JP	16	187
SUE, Kenichiro	Tokyo, JP	1	2

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RELEASE FILM, METHOD FOR MANUFACTURING MOLDED ARTICLE, SEMICONDUCTOR COMPONENT, AND REFLECTOR COMPONENT

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14913706

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14913706

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