METHOD OF MANUFACTURING A PHOTOELECTRIC AND THERMOELECTRIC SENSOR, AND PHOTOELECTRIC AND THERMOELECTRIC SENSOR
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United States of America Patent
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Jul 7, 2016
app pub date -
Aug 5, 2015
filing date -
Jan 7, 2015
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Abstract
A method of manufacturing a photoelectric and thermoelectric sensor includes the steps of: preparing a silicon substrate and an etching solution that includes hydrofluoric acid, isopropyl alcohol and deionized water; performing electrochemical etching on the silicon substrate in the etching solution to obtain a porous silicon substrate; and forming on the porous silicon substrate an electrode unit that is connected to the porous silicon substrate and that is adapted for being connected to an external circuit.
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