BARRIER FABRIC SUBSTRATE WITH HIGH FLEXIBILITY AND MANUFACTURING METHOD THEREOF

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United States of America Patent

APP PUB NO 20160190513A1
SERIAL NO

14983374

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Abstract

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A flexible barrier fabric substrate includes a fabric base material, a planarization layer formed on the fabric base material, and a barrier layer formed on the planarization layer. One or more inorganic thin film layers and one or more polymer thin film layers are alternately stacked in the barrier layer.

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Patent Owner(s)

Patent OwnerAddress
KOLON GLOTECH INC8F KOLON TOWER 1-23 BYEORYANG-DONG GWACHEON-SI GYEONGGI-DO 427-040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Soo-Heon Yongin, KR 4 4
Park, Beob Yongin, KR 3 3
Park, Byoung-Cheul Seosan, KR 1 1

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