APPARATUS FOR CONTINUOUSLY FORMING A FILM THROUGH CHEMICAL VAPOR DEPOSITION
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United States of America Patent
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Jun 30, 2016
app pub date -
Dec 26, 2014
filing date -
Dec 26, 2014
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Abstract
An apparatus for continuously forming a film through chemical vapor deposition includes a conveyor unit, a depositing unit and a cooling mechanism. The conveyor unit is for conveying a substrate along a moving path. The depositing unit includes at least one deposition chamber disposed to deposit a film-forming material on the substrate. The cooling mechanism includes inlet and outlet cooling units that are disposed oppositely relatively to the deposition chamber, that are communicated fluidly with the deposition chamber and that are controllable to provide a cooling temperature preventing the film-forming material from escaping and scattering away from the inlet and outlet cooling units.
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