COPOLYMER FORMULATION FOR DIRECTED SELF ASSEMBLY, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME
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United States of America Patent
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Issued Date -
Jun 30, 2016
app pub date -
Nov 18, 2015
filing date -
Dec 30, 2014
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Abstract
Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; an additive polymer comprising a reactive functional moiety that forms a bond with or a complex or a coordinate with the substrate upon being disposed on the substrate; and a solvent; and annealing the composition to facilitate bonding or complexation or coordination of the additive polymer to the substrate and domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer.
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