RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER
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United States of America Patent
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Mar 10, 2016
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Sep 12, 2013
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Abstract
A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R1 to R4 has the fluorine atom or a group including the fluorine atom. R5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).
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