Geometrically Enhanced Resistive Random Access Memory (RRAM) Cell And Method Of Forming Same

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United States of America Patent

SERIAL NO

14582089

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Abstract

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A memory device (and method of making and using the memory device) includes a first electrode of conductive material, a second electrode of conductive material, and a layer transition metal oxide material that includes first and second elongated portions meeting each other at a sharp corner. Each of the first and second elongated portions is disposed between and in electrical contact with the first and second electrodes.

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Patent Owner(s)

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SILICON STORAGE TECHNOLOGY INC450 HOLGER WAY SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Do, Nhan Saratoga, US 220 1249
Liu, Xian Sunnyvale, US 96 967
Nguyen, Hung Quoc Fremont, US 67 454
Tran, Hieu Van San Jose, US 354 3483
Zhou, Feng Fremont, US 368 1663

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