PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM
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United States of America Patent
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Issued Date -
Jun 23, 2016
app pub date -
Dec 10, 2015
filing date -
Dec 22, 2014
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Abstract
A photosensitive polysiloxane composition having good developing properties and good operational reliability of development, a protective film, and an element having the protective film are provided. The photosensitive polysiloxane composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), and a solvent (D). The alkali-soluble resin (A) includes a polysiloxane (A-1). The compound (B) having an ethylenically unsaturated group includes a compound (B-1) having an ethylenically unsaturated group, wherein the compound (B-1) having an ethylenically unsaturated group includes at least one of a (meth)acrylate monomer represented by formula (1) and a (meth)acrylate monomer represented by formula (2).
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