PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF

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United States of America Patent

SERIAL NO

14968720

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention relates to a photosensitive resin composition for a black matrix, a color filter and a liquid crystal display element formed by the black matrix. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a solvent (D) and a black pigment (E). The photosensitive resin composition for the black matrix has the advantage of improving resolution and taper angle.

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Patent Owner(s)

Patent OwnerAddress
CHI MEI CORPORATION59-1 SAN CHIA JEN TE TAINAN CITY 71702

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
LIAO, HAO-WEI TAINAN CITY, TW 18 48
TSAI, YU-JIE TAINAN CITY, TW 9 23

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