METHOD FOR SPUTTERING SYSTEM AND USING COUNTERWEIGHT
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United States of America Patent
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Issued Date -
Jun 23, 2016
app pub date -
Feb 25, 2016
filing date -
Nov 4, 2011
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Abstract
A method for depositing material from a target onto substrates, comprising using a processing chamber; a sputtering target having length L and having sputtering material provided on front surface thereof; a magnet operable to reciprocally scan across the length L in close proximity to rear surface of the target; and a counterweight operable to reciprocally scan at same speed but opposite direction of the magnet; and moving the magnets at speeds at least several times faster than the speed of the substrates.
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