METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE
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United States of America Patent
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Jun 16, 2016
app pub date -
Dec 1, 2015
filing date -
Dec 12, 2014
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Abstract
The present invention relates to a method of finishing a pre-polished TiO2—SiO2 glass substrate, containing a step of measuring a striae-originated MSFR (MSFR0) of a major surface, a step of measuring a TiO2 concentration distribution (ΔTiO2) in the major surface, a first and second processing steps of processing the major surface, and a cleaning step of cleaning the major surface, in which according to the MSFR0 (nm) and the ΔTiO2 (wt %), the total etching amount (nm) of a chemical etching amount of the major surface in the second processing step and another chemical etching amount of the major surface in the cleaning step is controlled to satisfy the following expression (1)
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