PROCESS FOR REDUCING THE LEVEL OF CHLORIDE IN CHLOROSILANE DIRECT PROCESS HYDROLYZED SUBSTRATE USING MECHANOCHEMICAL TREATMENT

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United States of America Patent

APP PUB NO 20160167988A1
SERIAL NO

14565989

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Abstract

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The present invention relates to a process for providing a low-chloride hydrolyzate comprising subjecting an acid or base hydrolyzed substrate of a chlorosilane direct process residue to a mechanochemical means to provide a hydrolyzate with a chloride content of less than about 1.1% by weight. The process of present invention is especially useful in cement kilns and smelter operation.

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Patent OwnerAddress
MOMENTIVE PERFORMANCE MATERIALS INC2750 BALLTOWN ROAD NISKAYUNA NY 12309

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lunden, Mark Ballston Lake, US 1 0
Nye, Susan A Feura Bush, US 32 401
Schlitzer, David S Ballston Spa, US 6 27

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