FORMING SACRIFICIAL STRUCTURES USING PHASE-CHANGE MATERIALS THAT SUBLIMATE

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United States of America Patent

SERIAL NO

14567010

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Abstract

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A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.

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Patent Owner(s)

Patent OwnerAddress
PALO ALTO RESEARCH CENTER INCORPORATED3333 COYOTE HILL ROAD PALO ALTO CA 94304

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsieh, Bing R Pleasanton, US 88 1345
Ng, Tse Nga Sunnyvale, US 60 337
Ready, Steven E Los Altos, US 67 691

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