METHOD FOR PURIFICATION OF OFF-GAS AND DEVICE FOR THE SAME
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United States of America Patent
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Jun 16, 2016
app pub date -
Aug 12, 2014
filing date -
Aug 28, 2013
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Abstract
This disclosure relates to a method for purification of off-gas and a device for the same. More particularly, this disclosure relates to a method for purification of off-gas that removes hydrogen chloride from the off-gas discharged after conducting a polysilicon deposition process by chemical vapor deposition, and can separate hydrogen of high purity, and a device for the same.
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