TANTALUM OXIDE FILM REMOVAL METHOD AND APPARATUS
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United States of America Patent
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Jun 9, 2016
app pub date -
Apr 9, 2014
filing date -
Jun 21, 2013
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Abstract
In a tantalum oxide film removal method and apparatus, a silicon substrate having a tantalum oxide film is supported on a spin chuck. A mixed aqueous solution including hydrofluoric acid and organic acid is supplied to the silicon substrate while rotating the silicon substrate together with the spin chuck. The mixed aqueous solution comes into contact with the tantalum oxide film existing on the silicon substrate to remove the tantalum oxide film by the chemical reaction therebetween.
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