SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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app pub date -
Mar 31, 2015
filing date -
Nov 28, 2014
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Abandoned
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Abstract
A substrate processing apparatus includes: a process chamber configured to process substrates; a substrate mounting stand installed in the process chamber and configured to support the substrates along a circumferential direction; a rotating unit configured to rotate the substrate mounting stand; a first gas supplier configured to supply a first gas from above the substrate mounting stand; a second gas supplier configured to supply a second gas from above the substrate mounting stand; a third gas supplier configured to supply a cleaning gas from above the substrate mounting stand; and an elevator configured to maintain the substrate mounting stand at a substrate processing position while supplying the first gas and the second gas and also configured to maintain the substrate mounting stand at a cleaning position while supplying the cleaning gas.
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