FLOURINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERNING, PHOTODEGRADABLE COUPLING AGENT, PATTERNING METHOD, AND COMPOUND

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United States of America Patent

SERIAL NO

15013193

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Abstract

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A fluorine-containing compound represented by General formula (1), wherein X represents a halogen atom or an alkoxy group, R1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, Rf1 and Rf2 are each independently a fluorinated alkoxy group, and n represents an integer of 0 or more.

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATIONTOKYO 108-6290
KANAGAWA UNIVERSITY3-27-1 ROKKAKUBASHI KANAGAWA-KU YOKOHAMA-SHI KANAGAWA 2218686

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KAWAKAMI, Yusuke Yokohama, JP 59 667
YAMAGUCHI, Kazuo Yokohama, JP 96 1280

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