Methods For Fabricating Magnetic Devices And Associated Systems And Devices
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United States of America Patent
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Issued Date -
May 26, 2016
app pub date -
Jun 13, 2014
filing date -
Jun 14, 2013
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Abandoned
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Abstract
A method for exposing a photoresist material to light includes the following steps: (1) optically coupling the light to an optical mask via a prism and a first liquid layer joining the prism and the optical mask, (2) masking the light using the optical mask, and (3) optically coupling the masked light to the photoresist material. The method is used, for example, to fabricate a magnetic device on a semiconductor substrate. A hybrid semiconductor and magnetic device includes a semiconductor substrate and a top insulating structure deposited on an outer surface of the semiconductor substrate. The top insulating structure has opposing first and second sloping sidewalls, where each sloping sidewall forms an acute angle of at least 30 degrees, relative to an axis normal to the outer surface of the semiconductor substrate. The hybrid semiconductor and magnetic device further includes a magnetic core surrounding the top insulating structure.
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