METHOD FOR PRODUCING A THIN FILM TRANSISTOR
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United States of America Patent
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Issued Date -
May 26, 2016
app pub date -
Dec 5, 2014
filing date -
Dec 5, 2014
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Abstract
A method for producing a thin film transistor includes forming a transistor prototype on a substrate, with the transistor prototype including a face having a to-be-treated portion. The to-be-treated portion of the transistor prototype is exposed in an environment full of a supercritical fluid. The supercritical fluid conducts a surface treatment on the to-be-treated portion of the transistor prototype to form a thin film transistor. The method can solve the problem of too many defects of the thin film transistor resulting from a low-temperature process.
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