RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLAC RESIN
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United States of America Patent
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May 26, 2016
app pub date -
Jun 23, 2014
filing date -
Jun 25, 2013
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Abstract
An excellent resist underlayer film having a selectivity of dry etching rate close to that of a resist, selectivity of dry etching rate lower than that of a resist, or selectivity of dry etching rate lower than that of semiconductor substrate. Resist underlayer film-forming composition including a polymer containing unit structure of Formula (1):
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