MICRO-ELELCTRO-MECHANICAL SYSTEM DEVICE AND METHOD FOR FABRICATING THE SAME
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United States of America Patent
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Issued Date -
May 26, 2016
app pub date -
Jun 17, 2015
filing date -
Jun 17, 2015
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Abandoned
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Abstract
A method for fabricating a micro-electro-mechanical system (MEMS) device includes following steps. A cap layer is formed on an MEMS structure. The MEMS structure has a plurality of sacrificial structures. The cap layer has a plurality of release holes. The release holes are located on the sacrificial structures. A dielectric layer is formed on the cap layer, and the dielectric layer fills the release holes. A planarization process is performed on the dielectric layer. The sacrificial structures are then removed to form at least one cavity in the MEMS structure.
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