COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING
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United States of America Patent
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May 26, 2016
app pub date -
Mar 2, 2015
filing date -
Nov 21, 2014
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Abstract
Coated compressive subpads for polishing pad stacks and methods of fabricating coated compressive subpads for polishing pad stacks are described. In an example, a polishing pad stack for polishing a substrate includes a polishing pad having a polishing surface and a back surface. The polishing pad stack also includes a compressive subpad with a first surface having a first pressure sensitive adhesive layer coated thereon. The first surface of the compressive subpad is coupled directly to the back surface of the polishing pad by the first pressure sensitive adhesive layer.
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