USE OF SILICON NITRIDE AS A SUBSTRATE AND A COATING MATERIAL FOR THE RAPID SOLIDIFICATION OF SILICON

United States of America Patent

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Issued Date
May 19, 2016
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Jul 10, 2014
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Jul 10, 2014

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Abstract

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Silicon nitride particles are used as a coating or substrate material for kerfless wafer making technologies.

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Patent Owner	Address
SACHS CHRISTOPH	Not Provided

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Sachs, Christoph	Herzogenrath, DE	6	3

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USE OF SILICON NITRIDE AS A SUBSTRATE AND A COATING MATERIAL FOR THE RAPID SOLIDIFICATION OF SILICON

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14900884

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14900884

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