TARGET FOR THE REACTIVE SPUTTER DEPOSITION OF ELECTRICALLY INSULATING LAYERS
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United States of America Patent
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Issued Date -
May 19, 2016
app pub date -
Jul 9, 2014
filing date -
Jul 9, 2014
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Abstract
A target whose target surface is embodied so that the use of the target for reactive sputter deposition of electrically insulating layers in a coating chamber avoids a production of a spark discharge from the target surface to an anode that is situated in the coating chamber.
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