GUARD RING FOR MEMORY ARRAY

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United States of America Patent

APP PUB NO 20160133637A1
SERIAL NO

14997994

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A device and a method for forming a device are presented. The method includes providing a substrate having an array region in which memory cells are to be formed. Storage gates of the memory cells are formed in the array region. A guard ring surrounding the array region is formed. A gate electrode layer is formed on the substrate. The gate electrode layer fills gaps between the storage gates and guard ring. The gate electrode layer is planarized to produce a planar surface between the gate electrode layer, storage gates and guard ring. The guard ring maintains thickness of the gate electrode layer in the array region such that thickness of the storage gates across center and edge regions of the array region is uniform.

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Patent Owner(s)

Patent OwnerAddress
GLOBALFOUNDRIES SINGAPORE PTE LTD60 WOODLANDS INDUSTRIAL PARK D STREET 2 SINGAPORE 738406

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
JUNG, Sung Mun Singapore, SG 53 375
LIM, Kian Hong Singapore, SG 7 66
WU, Ling Singapore, SG 85 436
YANG, Jianbo Singapore, SG 100 386

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