Transmission balancing for phase shift mask with a trim mask
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United States of America Patent
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May 17, 2016
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N/A
app pub date -
Oct 30, 2014
filing date -
Oct 30, 2014
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Abstract
Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
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