DEPOSITION METHOD FOR TUNGSTEN-CONTAINING FILM USING TUNGSTEN COMPOUND, AND PRECURSOR COMPOSITION FOR DEPOSITING TUNGSTEN-CONTAINING FILM, COMPRISING TUNGSTEN COMPOUND

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May 5, 2016
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May 26, 2014
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May 24, 2013

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Abstract

The present disclosure relates to a deposition method for a tungsten-containing film using a tungsten compound and a precursor composition for depositing the tungsten-containing film including the tungsten compound.

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UP CHEMICAL CO LTD	81 SANDAN-RO 197BEON-GIL PYEONGTAEK-SI GYEONGGI-DO PYEONGTAEK-SI 17749

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Inventor Name	Address	# of filed Patents	Total Citations
HAN, Won Seok	Anseong-si, KR	44	157
LEE, Hong-Joo	Deojeon, KR	1	4
YOO, Beom-Sang	Asan-si, KR	1	4

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DEPOSITION METHOD FOR TUNGSTEN-CONTAINING FILM USING TUNGSTEN COMPOUND, AND PRECURSOR COMPOSITION FOR DEPOSITING TUNGSTEN-CONTAINING FILM, COMPRISING TUNGSTEN COMPOUND

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14893427

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14893427

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