BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD

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United States of America Patent

SERIAL NO

14901525

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Abstract

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It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM WAKO PURE CHEMICAL CORPORATION1-2 DOSHOMACHI 3-CHOME CHUO-KU OSAKA-SHI OSAKA 540-8605

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ARIMITSU, Koji Tokyo, JP 26 62
SAKAI, Nobuhiko Kawagoe-shi, Saitama, JP 11 56
YANABA, Kosuke Kawagoe-shi, Saitama, JP 8 26

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